AngstromPure® Water

For semiconductor mass-fabrication

BackgroundBeyond Type 1 water

Need for water with higher purity levels in nano-technological R&D and fabrication, calls for an extended classification system. Water purity-classification systems serves as important tools for standardization and quality assurance in R&D as well as industrial environments.

The ”metrology-gap” caused by difficulties to simultaneously detect matter of low abundance and minute size is an obstacle for characterization of water purity classes relevant for Angstrom-scale metrics. Nanosized developed an analytical tool, NDLS®, based on Dynamic Light Scattering used in a novel manner. Most important is the use of AngstromPure water in the testing procedure.

Based on NDLS, we introduce a classification system based on three main classes. These are APW defined as freshly generated water from an ideal membrane distillation module, NPW defined as APW stored in coated vessels and UPW according to current classification systems.

Virgin Water™ leaves no traces after evaporation in contrast to …

Review the PoC: ”Dry spots impact on Cycle time”


AngstromPure® Water

Nanosized has two synergetic, disruptive and patented technologies developed in parallel and interactively.

One is Winsty™ which is a unique Membrane Distillation module generating water of outermost purity.

The purity of this AngstromPure Water (APW) is validated using the second technology, NDLS® as well dry methods like ESCA and SEM, proving total particle absence down to the size of the water molecule itself.

– To measure is to know!

The remarkable aggressiveness of APW is the property utilized for effective rinsing of semiconductor wafers. Freshly produced, it is called Virgin Water™. If stored, it immediately starts to dissolve the walls of the storage-vessel.

Our Industrial pilot, YET™-P2

The updated Yield Enhancement Tool – P2 is a CE-marked TRL6 industrial pilot for continous production of AngstromPure water.

InvestorInvest In Purity



Fab-EconomyFAB-Economy & the "Hidden Asset"

Today some 80..90% of the available virgin wafer area is used for chip manufacturing.

We expect that to be increased substantially using our technology.


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UPW, conventional Ultra-Pure Water has been used for rinsing purposes in microchip manufacturing for decades. This is an extremely water-consuming process. It is not sustainable. It is very expensive. Still, too often it ends up with substandard chips. This because of poor water quality. So how come?

There has been no alternative. Until now.